Sputtering Target Material, Ceramic Targets and Metal Sputtering Target

                
Custom / Planner / Rotary Cu Copper Target For Sputtering Coating

Niobium Oxide Nb2O5 Target For Sputtering Pulsed Laser Deposition

Aluminum Doped Zinc Oxide Target High Density AZO Sputtering Target

TiN Titanium Nitride Sputtering Target For Hard Coatings

CrC Chromium Carbide Sputtering Target Corrosion Resistance For PVD Coating

High Resistance GXO Target Forming Process Sintering Custom Shaped

SiC Silicon Carbide Sputtering Target High Temperature Corrosion Resistance

InCeO Indium Cerium Oxide Target High Transmittance Low Resistivity

Titanium Boride TiB2 Ceramic Sputtering Target For PVD Coating

Zinc Tin Oxide Target ZTO Ceramic Targets Relative Density ≥98%

Indium Zinc Oxide IZO Target Material For Display Technology

NiOx Nickel Oxide Target Material For Solar Power Battery

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Shenzhen APG Material Company Limited

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Shenzhen APG Material Company Limited

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City: Shenzhen

Country/Region: China

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Shenzhen APG Material Company Limited

Account Registered in: 2026

Last Login Date: September 16, 2026

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