Titanium oxide targets are ceramic targets made from high-purity titanium dioxide (TiO₂), produced through processes like hot-press sintering or cold isostatic pressing. It has characteristics like high hardness, high melting point (around 1855℃), and excellent chemical stability, making it an important material for magnetron sputtering to produce optical and functional films.

Outstanding Properties of Titanium Oxide Target (TiOx)

l High Purity Ensures Film Quality

Titanium oxide targets typically have a purity ≥ 99.9%, with very low impurity content, effectively reducing film defects and improving optical and electrical performance stability.

l Excellent Chemical Stability

Titanium oxide targets are resistant to acid and alkali corrosion, maintaining stable performance in harsh environments like high temperature and high humidity, which extends the lifespan of the films.

l Outstanding Optical Properties

It has a high refractive index and excellent transmittance, enabling the production of high-performance optical films suitable for anti-reflection coatings (AR), anti-glare coatings, etc.

l Dense and Uniform Microstructure

Using advanced forming and sintering processes, the titanium oxide target material has fine and uniform particles, ensuring stable film deposition rate and good thickness consistency.

l Good Mechanical Strength and Heat Resistance

With a melting point of around 1855℃, titanium oxide targets are resistant to cracking or damage under high-power sputtering conditions, making them suitable for long-term continuous production.

Wide Applications of Titanium Oxide Target (TiOx)

l Optical Device Manufacturing

Titanium oxide targets are used to produce high refractive index films for optical lenses, anti-reflection coatings (AR Coatings), anti-glare films, and optical filters, improving light transmittance and image quality.

l Photovoltaic Industry

Used as protective or functional layers in transparent conductive films (TCO), titanium oxide targets improve light absorption efficiency and device stability, widely used in the production of solar cells and photocatalytic films.

l Semiconductor Manufacturing

Titanium oxide targets are used as dielectric layers, protective films, and insulating materials to improve the stability and insulation performance of chips and electronic devices.

l Low-Emission (Low-E) Energy-Saving Glass

Titanium oxide targets serve as key functional layer materials designed to improve the heat insulation and light transmittance of glass. These properties effectively reduce energy consumption, leading to their wide application in advanced building energy-saving solutions.

Shenzhen APG Material Company Limited (APG), headquartered in Shenzhen, China, currently operates three factories located in Shenzhen, Changzhou, and Changsha, and employs more than 200 people.

APG specializes in the research and development (R&D) and production of PVD materials (sputtering targets and evaporation materials), pastes, and powders. These products serve industries such as PV solar cells, optics, semiconductors, smart touch and display manufacturing, Low-E glass production, permanent magnets, power batteries, and decorative and functional coating applications.

APG utilizes leading production technologies, including sintering, plasma spraying, and melting. The company produces ceramic materials, compound materials, metals, and alloy materials, and also provides bonding and backing plate services. APG possesses the necessary technology and equipment to produce both powder and pastes.

APG maintains a strong technical team and R&D department, which accounts for more than 20% of the company's total employees. This team focuses on developing new materials and technologies and holds numerous patents. Additionally, APG operates an inspection center equipped with various instruments to guarantee the stable quality of all products. APG is committed to the research, development, and production of high-performance materials and delivering excellent service to its customers.