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Mo Metal Sputtering Target Molybdenum Sputtering Target

Shenzhen APG Material Company Limited
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    Buy cheap Mo Metal Sputtering Target Molybdenum Sputtering Target from wholesalers
     
    Buy cheap Mo Metal Sputtering Target Molybdenum Sputtering Target from wholesalers
    • Buy cheap Mo Metal Sputtering Target Molybdenum Sputtering Target from wholesalers
    • Buy cheap Mo Metal Sputtering Target Molybdenum Sputtering Target from wholesalers

    Mo Metal Sputtering Target Molybdenum Sputtering Target

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    Brand Name : APG
    Certification : ISO9001、ISO14001、ISO45001、IAFT16949
    Delivery Time : 4-5 weeks
    Payment Terms : T/T
    Supply Ability : Stable supply
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    Mo Metal Sputtering Target Molybdenum Sputtering Target

    Molybdenum targets, a rising star in high-performance materials

    With the continuous advancement of material science, molybdenum targets have emerged as a key driver in various fields. Molybdenum targets are critical across the semiconductor, display, photovoltaic, and high-end manufacturing sectors, delivering unique performance advantages that drive industrial innovation.

    Excellent Properties of Molybdenum Targets

    l Ultra-high Purity


    Molybdenum targets typically have a high purity of ≥99.95%, with some reaching 5N (99.999%). Extremely low impurity content, such as Fe and Ni <50ppm, and O <200ppm, ensures stable electrical performance of sputtered films, laying a solid foundation for high-precision applications like semiconductor chip manufacturing.

    l High-temperature Oxidation Resistance


    With an ultra-high melting point of 2623℃, weight gain from oxidation in air at 1000℃ is <0.1mg/cm² (100 hours). For example, a photovoltaic company using Mo targets to prepare TCO films showed no failure after 500 hours under 85℃/85% RH testing, demonstrating outstanding stability in high-temperature and harsh environments.

    l Precise Structure and Excellent Conductivity


    Density: 10.28 g/cm³ (99% theoretical), grain size <50μm, flatness ≤0.05mm (Φ100mm target). Excellent conductivity of high-purity Mo (resistivity 5.2 μΩ·cm) ensures efficient current transfer during sputtering, improving sputtering efficiency. The precise structural design is compatible with high-precision sputtering equipment, ensuring coating accuracy and uniformity.

    Applications of Molybdenum Targets

    l Semiconductor Industry


    Molybdenum targets are used in the semiconductor industry to prepare bottom electrodes for metal silicon wafers, providing stable current and ensuring wafer quality.

    l Display Panels


    Molybdenum target material is used in liquid crystal displays (LCDs) to enhance brightness, contrast, color, and lifespan.

    l Photovoltaic Industry


    Molybdenum targets are used in solar cell manufacturing as electrode materials, improving conversion efficiency.


    l Low-emissivity Glass


    Molybdenum targets are used in the production of STN/TN/TFT-LCDs and low-emissivity glass, suitable for various coating systems.

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